A reticle (stepper field) is the group of dies exposed in one lithography step. Pass reticleConfig to buildWaferMap to generate field boundary geometry, then pass reticles to renderWaferMap to draw the overlay. The same config gives every die a reticle cell (its place inside the mask) and a reticle shot (where on the wafer the mask was placed): open Insights to see the Reticle cell yield card on the Overview, or the My plots tab to colour, split or bar by cell and shot. A low cell points at the mask; a low shot points at something that varies across the wafer. analyzeWaferMap detects systematic defects at the same position within every field. Toggle the overlay on/off above, or switch to Value mode to see the parametric spatial pattern. The findings panel (open on the right) shows any detected reticle-position findings.