A reticle (stepper field) is the group of dies exposed in one lithography step. Pass `reticleConfig` to `buildWaferMap` to generate field boundary geometry, then pass `reticles` to `renderWaferMap` to draw the overlay. `analyzeWaferMap` with `enableReticlePositionAnalysis: true` detects systematic defects at the same position within every field. Toggle the overlay on/off above, or switch to Value mode to see the parametric spatial pattern. The findings panel (open on the right) shows any detected reticle-position findings.
Reticle overlay
Mode
Reticle configuration

Field width | —
Field height | —
Fields total | —
Dies/field | —

About reticles
A reticle (stepper field) is the group of dies exposed in a single lithography step. Defects in the mask, focus variation, or lens aberrations show up as systematic patterns at the same position within every field.